Effect of Vanadium Doping on Microstructure and Dielectric Behavior of CaCu<sub>3</sub>Ti<sub>4</sub>O<sub>12</sub> Ceramics - Archive ouverte HAL Access content directly
Journal Articles International Journal of Materials Science and Applications Year : 2017

Effect of Vanadium Doping on Microstructure and Dielectric Behavior of CaCu<sub>3</sub>Ti<sub>4</sub>O<sub>12</sub> Ceramics

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hal-02153095 , version 1 (12-06-2019)

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Séka Simplice Kouassi, Jean-Pierre Sagou Sagou, Cecile Autret, Sonia de Almeida-Didry, Anoop Nautiyal, et al.. Effect of Vanadium Doping on Microstructure and Dielectric Behavior of CaCu<sub>3</sub>Ti<sub>4</sub>O<sub>12</sub> Ceramics. International Journal of Materials Science and Applications, 2017, 6 (1), pp.54. ⟨10.11648/j.ijmsa.20170601.18⟩. ⟨hal-02153095⟩
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