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Journal articles
Internal Electric Field in Co-Doped BaTiO 3 With Co 2+/3+ , Nb 5+ , Li + , and F − : Impact on Functional Properties and Charge Compensation With Niobium and Fluorine Ions
Rémy Ul 1
Author
Franck Levassort 1
Author IdHAL : franck-levassort IdRef : https://www.idref.fr/168781751 ORCID : https://orcid.org/0000-0002-2019-9390
Michael Lematre
Author IdHAL : michael-lematre IdRef : https://www.idref.fr/16702423X ORCID : https://orcid.org/0000-0001-5953-0397
Louis-Pascal Tran-Huu-Hue 1
Author IdHAL : louis-pascal-tran-huu-hue IdRef : https://www.idref.fr/148602592 ORCID : https://orcid.org/0000-0003-4182-5247
Maï Pham-Thi 2
Author
1
GREMAN - UMR 7347 - GREMAN (matériaux, microélectronique, acoustique et nanotechnologies) (Bât. E, 20 avenue Monge, 37200 Tours - France)
- Université de Tours (60 rue du Plat d'Étain, 37020 Tours cedex 1 - France)
- INSA CVL - Institut National des Sciences Appliquées - Centre Val de Loire (88 boulevard Lahitolle, CS 60013, 18022 Bourges cedex - France)
- CNRS - Centre National de la Recherche Scientifique : UMR7347 (France)
2
Thales Research and Technology [Palaiseau] (1 Avenue Augustin Fresnel, 91767 Palaiseau cedex - France)
- THALES (France)
Document type :
Journal articles
Complete list of metadata
https://hal-univ-tours.archives-ouvertes.fr/hal-02000208
Contributor : Catherine Chenu <>
Submitted on : Wednesday, January 30, 2019 - 2:20:02 PM
Last modification on : Tuesday, November 19, 2019 - 4:47:45 PM
Contributor : Catherine Chenu <>
Submitted on : Wednesday, January 30, 2019 - 2:20:02 PM
Last modification on : Tuesday, November 19, 2019 - 4:47:45 PM
Identifiers
- HAL Id : hal-02000208, version 1
- DOI : 10.1109/TUFFC.2018.2878365
Collections
UNIV-TOURS | CNRS | GREMAN | INSA-GROUPE | INSA-CVL
Citation
Rémy Ul, Franck Levassort, Michael Lematre, Louis-Pascal Tran-Huu-Hue, Maï Pham-Thi. Internal Electric Field in Co-Doped BaTiO 3 With Co 2+/3+ , Nb 5+ , Li + , and F − : Impact on Functional Properties and Charge Compensation With Niobium and Fluorine Ions. IEEE Transactions on Ultrasonics, Ferroelectrics and Frequency Control, Institute of Electrical and Electronics Engineers, 2019, 66 (1), pp.154-162. ⟨10.1109/TUFFC.2018.2878365⟩. ⟨hal-02000208⟩
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